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Atomic‐scale structure and electronic properties of GaN/GaAs superlattices

 

作者: R. S. Goldman,   R. M. Feenstra,   B. G. Briner,   M. L. O’Steen,   R. J. Hauenstein,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 69, issue 24  

页码: 3698-3700

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.117193

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have investigated the atomic‐scale structure and electronic properties of GaN/GaAs superlattices produced by nitridation of a molecular beam epitaxially grown GaAs surface. Using cross‐sectional scanning tunneling microscopy (STM) and spectroscopy, we show that the nitrided layers are laterally inhomogeneous, consisting of groups of atomic‐scale defects and larger clusters. Analysis of x‐ray diffraction data in terms of fractional area of clusters (determined by STM), reveals a cluster lattice constant similar to bulk GaN. In addition, tunneling spectroscopy on the defects indicates a conduction band state associated with an acceptor level of NAsin GaAs. Therefore, we identify the clusters and defects as nearly pure GaN and NAs, respectively. Together, the results reveal phase segregation in these arsenide/nitride structures, in agreement with the large miscibility gap predicted for GaAsN. ©1996 American Institute of Physics.

 

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