Nanofabrication of grating and dot patterns by electron holographic lithography
作者:
Keiko Ogai,
Yoshihide Kimura,
Ryuichi Shimizu,
Junichi Fujita,
Shinji Matsui,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 12
页码: 1560-1562
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113646
出版商: AIP
数据来源: AIP
摘要:
Line and dot patterns with about a 100 nm period are exposed on poly‐methyl methacrylate (PMMA) resist by electron holographic lithography with a W〈100〉 thermal field emission (TFE) gun and an electron biprism. Subsequent atomic force microscope (AFM) observation has confirmed that both patterns are successfully fabricated. This technique allows one to produce nanoscale periodic patterns simultaneously, whose spacing could be, in principle, comparable to a lattice spacing. ©1995 American Institute of Physics.
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