首页   按字顺浏览 期刊浏览 卷期浏览 Range profiles of Xe+and Xe2+of energy 50 to 400 keV in quartz crystal
Range profiles of Xe+and Xe2+of energy 50 to 400 keV in quartz crystal

 

作者: Ke‐Ming Wang,   Bo‐Rong Shi,   Hai‐Yan Guo,   Ji‐Tian Liu,   Xiang‐Dong Liu,   Lu Chen,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 67, issue 6  

页码: 2700-2703

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.345487

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The Rutherford backscattering technique has been used to determine the depth profile of Xe+and Xe2+implanted into amorphized quartz crystal at energies from 50 to 400 keV. Based on Biersack’s angular diffusion model, an efficient method has been developed for comparison with experimental data. The results show that the measured mean projected range is in quite good agreement with calculated value for first‐order treatment. A marked improvement in range straggling is obtained after considering the second order energy loss. Also the results are compared to transport of ions in matter prediction.

 

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