Range profiles of Xe+and Xe2+of energy 50 to 400 keV in quartz crystal
作者:
Ke‐Ming Wang,
Bo‐Rong Shi,
Hai‐Yan Guo,
Ji‐Tian Liu,
Xiang‐Dong Liu,
Lu Chen,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 67,
issue 6
页码: 2700-2703
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.345487
出版商: AIP
数据来源: AIP
摘要:
The Rutherford backscattering technique has been used to determine the depth profile of Xe+and Xe2+implanted into amorphized quartz crystal at energies from 50 to 400 keV. Based on Biersack’s angular diffusion model, an efficient method has been developed for comparison with experimental data. The results show that the measured mean projected range is in quite good agreement with calculated value for first‐order treatment. A marked improvement in range straggling is obtained after considering the second order energy loss. Also the results are compared to transport of ions in matter prediction.
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