A technique for measuring the magnetostriction coefficients of epitaxial garnet films on 50‐mm‐diam wafers is described. The measurement is based on the shift of the microwave ferrimagnetic resonance produced by stressing the film, which is achieved by supporting the wafer around its circumference and reducing the atmospheric pressure on one side. A simple, nonresonant transmission microwave spectrometer which is well suited for measurements on large wafers is also described.