Epitaxy of AIBIIIC 2VIsemiconductors
作者:
B. Schumann,
A. Tempel,
G. Kühn,
期刊:
Crystal Research and Technology
(WILEY Available online 1988)
卷期:
Volume 23,
issue 1
页码: 3-16
ISSN:0232-1300
年代: 1988
DOI:10.1002/crat.2170230102
出版商: WILEY‐VCH Verlag
数据来源: WILEY
摘要:
AbstractEpitaxial layers of AIBIIIC 2VIcompounds were grown by the flash evaporation technique and investigated using reflection electron diffraction. Geometric‐structural considerations allow the prediction of epitaxial relationships and types of epitaxy (one‐ or three‐dimensional, multiple orientation). These properties of the epitaxial layers were confirmed experimentally. Furthermore, the epitaxial temperature ranges, non‐equilibrium phases, defects, and special features of the epitaxial growth are described. Especially, the influence of lattice misfit is
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