Adhesion enhancement of ion beam mixed Cu/Al/polyimide
作者:
G. S. Chang,
S. M. Jung,
Y. S. Lee,
I. S. Choi,
C. N. Whang,
J. J. Woo,
Y. P. Lee,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 1
页码: 135-138
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.363999
出版商: AIP
数据来源: AIP
摘要:
Cu (400 Å)/polyimide was mixed with 80 keV Ar+and N2+from 1.0×1015to 2.0×1016ions/cm2. The same processes were repeated for the Cu (400 Å)/Al (50 Å)/polyimide system which has Al as a buffer layer. The quantitative adhesion strength was measured by a standard scratch test. X-ray photoelectron spectroscopy was employed to investigate the change in the chemical bonds of the ion beam mixed polyimide substrate and the intermediate effects for the adhesion enhancement in Cu/Al/polyimide. Two distinct tendencies are observed in the adhesion strength: Cu/Al/polyimide is more adhesive than Cu/polyimide after ion beam mixing, and N2+ions are more effective in the adhesion enhancement than Ar+. The formation of an interlayer compound of CuAl2O4accounts for the former, while the latter is understood by the fact that N2+ions produce more pyridinelike moiety, amide group and tertiary amine moiety which are known as adhesion promoters. ©1997 American Institute of Physics.
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