Application of ellipsometry to crystal growth by organometallic molecular beam epitaxy
作者:
D. E. Aspnes,
W. E. Quinn,
S. Gregory,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 25
页码: 2569-2571
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102868
出版商: AIP
数据来源: AIP
摘要:
We report the first use of ellipsometry as a real‐time monitor of III‐V semiconductor crystal growth by molecular beam epitaxy, specifically growth of GaAs and AlGaAs from arsine, triethylgallium, and triethylaluminum sources. Our results provide new insight into the oxide desorption process and show a sensitivity of ±0.03 in compositionsx>0.2 for 10 A˚ thickness increments of AlxGa1−xAs during initial deposition on GaAs.
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