High‐Resolution Electron Microscopy of the Silicon Carbide/Aluminum Carbide Interface
作者:
Toyohiko Yano,
Satoshi Kato,
Takayoshi Iseki,
期刊:
Journal of the American Ceramic Society
(WILEY Available online 1992)
卷期:
Volume 75,
issue 3
页码: 580-586
ISSN:0002-7820
年代: 1992
DOI:10.1111/j.1151-2916.1992.tb07846.x
出版商: Blackwell Publishing Ltd
关键词: silicon carbide;aluminum;interfaces;joining;electron microscopy
数据来源: WILEY
摘要:
The interface of single‐crystal SiC and Al brazed at 1273 K is investigated by high‐resolution electron microscopy. The orientation relationship of SiC to the Al4C3reaction layer that forms between the SiC and the Al can be expressed as (0001)SiC∥(0001)Al4C3and [11∼00]SiC∥[11∼00]Al4C3. Furthermore, a very thin (two tetrahedral layers thick) transition phase and misfit dislocations are observed between the SiC and Al4C3lattices. The structure of the transition phase is discussed based on the high‐resolution electron microscopy, the stacking of the (Al,Si)C4tetrahedral layers, and the charge balance. The same reaction product, with the same orientation relationship, is observed at the interface of a polycrystalline SiC and Al
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