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Low-dose effects in the sputtering of evaporated films

 

作者: A.R. Oliva Florio,   E.V. Alonso,   R.A. Baragiola,   J. Ferron,  

 

期刊: Radiation Effects  （Taylor Available online 1983）
卷期: Volume 76, issue 4  

页码: 137-142

 

ISSN:0033-7579

 

年代: 1983

 

DOI:10.1080/01422448308209651

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

We report measurements of the dose dependence of the sputtering of evaporated films by 30 keV ions under UHV. An initial (sub-monolayer) enhanced sputtering is attributed to the removal of weakly bound atoms; this enhancement does not depend on the incidence angle of the projectile.

 

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