Sheath Potential Drop in the Presence of Impurities
作者:
Yu. Igitkhanov,
D. Naujoks,
期刊:
Contributions to Plasma Physics
(WILEY Available online 1996)
卷期:
Volume 36,
issue S1
页码: 67-72
ISSN:0863-1042
年代: 1996
DOI:10.1002/ctpp.19960360111
出版商: WILEY‐VCH Verlag
数据来源: WILEY
摘要:
AbstractThe effect of secondary electron emission and sputtered impurity ions on the sheath potential drop has been studied. An analytical model has been developed which allows a self‐consistent description of the above mentioned effects. In the analysis different materials (two kinds of graphite and tungsten) have been compared and a considerable dependence of the potential drop on the material choice has been observed. It is shown that the most of energy coming from the plasma to the target is carried by electrons because of both the decrease of potential drop caused by SEE and the enhancement of electron current to the plate caused by sputterin
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