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Sheath Potential Drop in the Presence of Impurities

 

作者: Yu. Igitkhanov,   D. Naujoks,  

 

期刊: Contributions to Plasma Physics  (WILEY Available online 1996)
卷期: Volume 36, issue S1  

页码: 67-72

 

ISSN:0863-1042

 

年代: 1996

 

DOI:10.1002/ctpp.19960360111

 

出版商: WILEY‐VCH Verlag

 

数据来源: WILEY

 

摘要:

AbstractThe effect of secondary electron emission and sputtered impurity ions on the sheath potential drop has been studied. An analytical model has been developed which allows a self‐consistent description of the above mentioned effects. In the analysis different materials (two kinds of graphite and tungsten) have been compared and a considerable dependence of the potential drop on the material choice has been observed. It is shown that the most of energy coming from the plasma to the target is carried by electrons because of both the decrease of potential drop caused by SEE and the enhancement of electron current to the plate caused by sputterin

 

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