Electron beam stimulated chemical vapor deposition of patterned tungsten films on Si(100)
作者:
R. B. Jackman,
J. S. Foord,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 49,
issue 4
页码: 196-198
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.97168
出版商: AIP
数据来源: AIP
摘要:
Electron irradiation of WF6films on Si has been studied using scanning Auger and electron microscopic techniques. In contrast to metal organics, electron stimulated decomposition of WF6is found to result in formation of pure W deposits; patterned films are formed by scanning the focused electron beam. The morphology of the films is particulate and the manner in which this originates is discussed.
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