Sputtering of Al2O3and LiNbO3in the electronic stopping region
作者:
Yuanxun Qiu,
J.E. Griffith,
T.A. Tombrello,
期刊:
Radiation Effects
(Taylor Available online 1982)
卷期:
Volume 64,
issue 1-4
页码: 111-116
ISSN:0033-7579
年代: 1982
DOI:10.1080/00337578208223000
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Because of recent interest in the role played by the thermal properties of materials that exhibit high energy sputtering, we have sputtered Al2O3and LiNbO3with chlorine ions at energies between 3 MeV and 25 MeV. To detect the sputtered Al and Nb we employ thin carbon catcher foils, which are analyzed with Rutherford scattering in the forward direction. Al surface densities of 1014/cm2and Nb surface densities of 10l3/cm2are easily measured. The sputtering yields for both Al2O3and LiNbO3increase rapidly with increasing chlorine energy, and the Al and Nb yields are both approximately 0.2 at 20 MeV. Tests for dose, beam current, and contamination effects will be discussed.
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