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Hot Stage for X‐Ray Diffraction of Ceramic Systems

 

作者: T. P. Seward,   F. N. Molea,   D. R. Uhlmann,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1965）
卷期: Volume 36, issue 12  

页码: 1851-1852

 

ISSN:0034-6748

 

年代: 1965

 

DOI:10.1063/1.1719479

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A resistance type heating device is described which adapts a standard high temperature x‐ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

 

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