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High‐amplitude photoemission oscillation of highly As‐rich GaAs (001) 2×4‐&ggr; phase during molecular beam epitaxy

 

作者: Hiroshi Tsuda,  

 

期刊: Journal of Applied Physics  (AIP Available online 1993)
卷期: Volume 73, issue 3  

页码: 1534-1536

 

ISSN:0021-8979

 

年代: 1993

 

DOI:10.1063/1.353229

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Photoemission oscillation from GaAs(001) surfaces illuminated by a deuterium lamp is studied for a highly As‐rich 2×4‐&ggr; phase during molecular beam epitaxy. The 2×4‐&ggr; phase shows higher oscillation amplitude than the As‐poorer 2×4‐&agr; phase. Oscillation of 2×4‐&ggr; occurs as a result of two‐dimensional nucleation, which is confirmed by the suppression of oscillation on highly misoriented GaAs(001) surfaces. Furthermore, the oscillation has its maxima at nearly half‐monolayer growth, which correspond to maximum step‐edge density. For this particular 2×4‐&ggr; phase, this implies that the surface with a higher step‐edge density emits more photoelectron and has a lower ionization energy threshold.

 

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