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Impact ionization coefficients in GaInPp–i–ndiodes

 

作者: R. Ghin,   J. P. R. David,   M. Hopkinson,   M. A. Pate,   G. J. Rees,   P. N. Robson,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 26  

页码: 3567-3569

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119235

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Impact ionization coefficients have been deduced from photomultiplication measurements performed onGa0.52In0.48Pp–i–ndiodes with nominal intrinsic region thicknesses of 1 .0, 0.7, and 0.2 &mgr;m. The results indicate that &bgr;, the hole ionization coefficient, is slightly greater than &agr;, the electron ionization coefficient at low fields, and they both become effectively equal at high fields. &agr; and &bgr; are also found to be significantly lower than GaAs across the range of electric fields studied, with correspondingly higher breakdown voltages. ©1997 American Institute of Physics.

 

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