Impact ionization coefficients in GaInPp–i–ndiodes
作者:
R. Ghin,
J. P. R. David,
M. Hopkinson,
M. A. Pate,
G. J. Rees,
P. N. Robson,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 26
页码: 3567-3569
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119235
出版商: AIP
数据来源: AIP
摘要:
Impact ionization coefficients have been deduced from photomultiplication measurements performed onGa0.52In0.48Pp–i–ndiodes with nominal intrinsic region thicknesses of 1 .0, 0.7, and 0.2 &mgr;m. The results indicate that &bgr;, the hole ionization coefficient, is slightly greater than &agr;, the electron ionization coefficient at low fields, and they both become effectively equal at high fields. &agr; and &bgr; are also found to be significantly lower than GaAs across the range of electric fields studied, with correspondingly higher breakdown voltages. ©1997 American Institute of Physics.
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