Bias-dependent 1/fnoise model of an m.o.s. transistor
作者:
W.V.Backensto,
C.R.Viswananathan,
期刊:
IEE Proceedings I (Solid-State and Electron Devices)
(IET Available online 1980)
卷期:
Volume 127,
issue 2
页码: 87-93
年代: 1980
DOI:10.1049/ip-i-1.1980.0016
出版商: IEE
数据来源: IET
摘要:
A 1/fnoise model of an m.o.s. transistor is developed which verifies previously observed dependences on the geometry and the density of surface states, but in addition predicts an explicit bias dependence. This model predicts that input 1/fvoltage noise gradually increases as the gate voltage increases near threshold and continues to increase for gate voltages well above threshold. It also predicts a gradual decrease in noise as the drain voltage increases to saturation. These prediction are experimentally verified.
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