A new process for patterning of YBa2Cu3Ox‐insulator multilayers is described, using a high‐temperature‐resistant CaO process mask, which can be evaporated directly onto previously patterned YBa2Cu3Oxlayers and removed after film deposition. A crossover contact of two 3 &mgr;m wide and 30 &mgr;m long YBa2Cu3Oxstriplines has been fabricated by laser deposition, using this patterning technique. The upper and the lower stripline of the crossover contact showTcvalues of ≊89 K and a critical current densityjc(77 K) of 2 and 4×106A/cm2, respectively. The contact between the upper and the lower stripline is superconducting below 87 K. At 100 K, the normal conducting contact resistivity is 5×10−8&OHgr; cm2, based on a contact area of 3×3 &mgr;m.