The mechanism of photoprotection of polystyrene film by some ultraviolet absorbers
作者:
G. A. George,
期刊:
Journal of Applied Polymer Science
(WILEY Available online 1974)
卷期:
Volume 18,
issue 1
页码: 117-124
ISSN:0021-8995
年代: 1974
DOI:10.1002/app.1974.070180110
出版商: Wiley Subscription Services, Inc., A Wiley Company
数据来源: WILEY
摘要:
AbstractThe efficiency of three commercial ultraviolet absorbers, a 2‐hydroxy benzophenone, a 2‐hydroxy benzotriazole, and a nickel chelate, in preventing the photo‐oxidation of polystyrene films has been measured. When compared with the calculated screening and phosphorescence quenching efficiency, it is found that (i) the nickel chelate protects the substrate by UV screening alone and is a poor photoprotector, and (ii) the 2‐hydroxy benzophenone and 2‐hydroxy benzotriazole are more efficient photoprotectors and protect by triplet energy transfer from excited polymer carbonyl impurity groups in addition to UV
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