首页   按字顺浏览 期刊浏览 卷期浏览 The sputtering yield of polycrystalline materials
The sputtering yield of polycrystalline materials

 

作者: P.F. Tortorelli,   C.J. Altstetter,  

 

期刊: Radiation Effects  (Taylor Available online 1980)
卷期: Volume 51, issue 3-4  

页码: 241-247

 

ISSN:0033-7579

 

年代: 1980

 

DOI:10.1080/00337578008210006

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Measurements were made of the sputtering yield of polycrystalline niobium due to 15 kev argon ion bombardment. The crystallographic orientations of individual grains were carefully surveyed using selected area electron channeling patterns. It was demonstrated that the average yield behavior could be calculated from theory provided allowance was made for ion channeling. The method for calculating yields can be applied to any combination of ion-polycrystalline target material provided the distribution of grain orientations (texture) is known.

 

点击下载:  PDF (744KB)



返 回