The sputtering yield of polycrystalline materials
作者:
P.F. Tortorelli,
C.J. Altstetter,
期刊:
Radiation Effects
(Taylor Available online 1980)
卷期:
Volume 51,
issue 3-4
页码: 241-247
ISSN:0033-7579
年代: 1980
DOI:10.1080/00337578008210006
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Measurements were made of the sputtering yield of polycrystalline niobium due to 15 kev argon ion bombardment. The crystallographic orientations of individual grains were carefully surveyed using selected area electron channeling patterns. It was demonstrated that the average yield behavior could be calculated from theory provided allowance was made for ion channeling. The method for calculating yields can be applied to any combination of ion-polycrystalline target material provided the distribution of grain orientations (texture) is known.
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