Hydrogen passivation of nitrogen in 6H–SiC
作者:
B. Theys,
F. Gendron,
C. Porte,
E. Bringuier,
C. Dolin,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 12
页码: 6346-6347
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366525
出版商: AIP
数据来源: AIP
摘要:
N-doped 6H–SiC wafers have been annealed in hot hydrogen for two doping levels, corresponding ton-(n∼1017 cm−3)andn+-type(n∼1019 cm−3)material. Electron spin resonance shows little passivation of N by hydrogen inn-type material, where secondary-ion-mass spectroscopy shows better penetration of deuterium. Both observations are accounted for in terms of Fermi-level control of the hydrogen charge state. ©1997 American Institute of Physics.
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