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Hydrogen passivation of nitrogen in 6H–SiC

 

作者: B. Theys,   F. Gendron,   C. Porte,   E. Bringuier,   C. Dolin,  

 

期刊: Journal of Applied Physics  (AIP Available online 1997)
卷期: Volume 82, issue 12  

页码: 6346-6347

 

ISSN:0021-8979

 

年代: 1997

 

DOI:10.1063/1.366525

 

出版商: AIP

 

数据来源: AIP

 

摘要:

N-doped 6H–SiC wafers have been annealed in hot hydrogen for two doping levels, corresponding ton-(n∼1017 cm−3)andn+-type(n∼1019 cm−3)material. Electron spin resonance shows little passivation of N by hydrogen inn-type material, where secondary-ion-mass spectroscopy shows better penetration of deuterium. Both observations are accounted for in terms of Fermi-level control of the hydrogen charge state. ©1997 American Institute of Physics.

 

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