The kinetics of the C49–C54 phase transformation inTiSi2narrow strips for width in the 0.5–1.3 &mgr;m range was investigated by sheet resistance measurements. The experimental data follow the Johnson–Mehl–Avrami equation for the fraction of the transformed material, with an exponent equal to 1 for all of the analyzed linewidths. Nucleation sites saturation occurs and the growth is one-dimensional along the length of the strip. The characteristic time, as obtained by the fit, increases as1/W,Wbeing the width of the strip, and a nucleation density of about 0.05 sites/&mgr;m2has been obtained. The distribution of the characteristic times around the average value increases with decreasing the linewidth. The amplitude of the dispersion is in quantitative agreement with the statistical fluctuation of the number of nucleation sites. ©1998 American Institute of Physics.