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Production of electron cyclotron resonance plasma for uniform deposition using a TE01mode microwave

 

作者: Ryota Hidaka,   Toru Yamaguchi,   Akihisa Tsuruta,   Masayoshi Tanaka,   Yoshinobu Kawai,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1994）
卷期: Volume 65, issue 5  

页码: 1590-1593

 

ISSN:0034-6748

 

年代: 1994

 

DOI:10.1063/1.1144897

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An electron cyclotron resonance (ECR) plasma is produced at pressures up to 10 mTorr with a circular TE01mode microwave. The plasma density is almost radially uniform even at 10 mTorr. SiC films are formed on silicon wafers by introducing methane gas into the ECR plasma. It is shown that a circular TE01mode microwave is useful for the ECR plasma chemical vapor deposition (CVD).  

 

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