Current andC‐Vinstabilities in SiO2at high fields
作者:
P. M. Solomon,
J. M. Aitken,
期刊:
Applied Physics Letters
(AIP Available online 1977)
卷期:
Volume 31,
issue 3
页码: 215-217
ISSN:0003-6951
年代: 1977
DOI:10.1063/1.89611
出版商: AIP
数据来源: AIP
摘要:
Results have been obtained concerning the interrelation of current andC‐Vinstabilities in MOS capacitors subjected to negative gate high‐field pulsing. Rising current transients and negativeC‐Vshifts both show the formation of positive charge in the oxide. However, this charge appears to be situated close to the electrodes rather than in the bulk of the oxide and the temperature dependence of the rate of charge accumulation near the electrodes is different for the aluminum and silicon electrodes. These results indicate that the current instabilities andC‐Vshifts appear to result from independent mechanisms.
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