The Deposition of Atoms Sputtered in an Abnormal Glow Discharge
作者:
H. Mase,
S. Nakaya,
Y. Hatta,
期刊:
Journal of Applied Physics
(AIP Available online 1967)
卷期:
Volume 38,
issue 7
页码: 2960-2962
ISSN:0021-8979
年代: 1967
DOI:10.1063/1.1710032
出版商: AIP
数据来源: AIP
摘要:
Using an optical‐transmission method, the deposition of sputtered Ni atoms on a glass collector in an abnormal glow discharge is measured in Ar and Ar‐H2mixture at 5 Torr. The distribution of atoms deposited on a glass collector is found to be determined by the diffusion process of sputtered atoms in the gases. The results show that the sputtering rate is proportional to the square of the current, and the sputtering rate of 100% Ar is about twice as large as that of 70% Ar‐30% H2mixture.
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