Removal of thin layer for trace element analysis of solid surface in subnanometer scale using laser-ablation atomic fluorescence spectroscopy
作者:
Yuji Oki,
Kenji Matsunaga,
Takumi Nomura,
Mitsuo Maeda,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 20
页码: 2916-2918
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120215
出版商: AIP
数据来源: AIP
摘要:
Laser-ablation atomic fluorescence (LAAF) spectroscopy has extremely high sensitivity in the analysis of trace elements. Using the ArF laser-ablation technique at a wavelength of 193 nm, removal of thin surface layer of the order of 1.1 nm/shot for the first 50 shots and 0.4 nm/shot after that is demonstrated for a solid glass sample. A constant fluorescence signal from Na atoms is obtained for each shot. There is a possibility of determining the depth distribution of an element with subnanometer resolution by applying LAAF spectroscopy. ©1997 American Institute of Physics.
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