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Removal of thin layer for trace element analysis of solid surface in subnanometer scale using laser-ablation atomic fluorescence spectroscopy

 

作者: Yuji Oki,   Kenji Matsunaga,   Takumi Nomura,   Mitsuo Maeda,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 20  

页码: 2916-2918

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120215

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Laser-ablation atomic fluorescence (LAAF) spectroscopy has extremely high sensitivity in the analysis of trace elements. Using the ArF laser-ablation technique at a wavelength of 193 nm, removal of thin surface layer of the order of 1.1 nm/shot for the first 50 shots and 0.4 nm/shot after that is demonstrated for a solid glass sample. A constant fluorescence signal from Na atoms is obtained for each shot. There is a possibility of determining the depth distribution of an element with subnanometer resolution by applying LAAF spectroscopy. ©1997 American Institute of Physics.

 

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