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Pressure control of rf bias for sputtering

 

作者: L. J. Kochel,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1976）
卷期: Volume 47, issue 12  

页码: 1556-1557

 

ISSN:0034-6748

 

年代: 1976

 

DOI:10.1063/1.1134550

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A method of simultaneously controlling vacuum pressure and substrate bias using only a pressure controller is described for an rf bias sputtering system in which the bias is developed through substrate tuning.

 

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