Stoichiometric disturbances in ion implanted GaAs and redistribution of Cr during annealing
作者:
T. J. Magee,
H. Kawayoshi,
R. D. Ormond,
L. A. Christel,
J. F. Gibbons,
C. G. Hopkins,
C. A. Evans,
D. S. Day,
期刊:
Applied Physics Letters
(AIP Available online 1981)
卷期:
Volume 39,
issue 11
页码: 906-908
ISSN:0003-6951
年代: 1981
DOI:10.1063/1.92602
出版商: AIP
数据来源: AIP
摘要:
Using the Boltzmann transport equation, calculations were obtained predicting the zones of stoichiometric imbalance produced in GaAs after ion implantation at energies of 50, 100, and 300 keV. The recoiling Ga and As atoms were shown to produce a zone of interstitials at depths exceedingRp. Secondary‐ion mass spectrometry profiling indicated that Cr was rapidly redistributed into these regions at temperatures ⩽500 °C. Transmission electron microscopic analyses obtained on horizontally sectioned and vertical cross section samples indicated that the interstitials coalesced into small clustered sites (50–100 A˚) and were responsible for the development of Cr gettering at depths ≳Rp.
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