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High‐temperature uniaxial stress apparatus for semiconductor defect symmetry determination

 

作者: S. Yang,   D. Lamp,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1993)
卷期: Volume 64, issue 1  

页码: 221-224

 

ISSN:0034-6748

 

年代: 1993

 

DOI:10.1063/1.1144439

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A mechanical apparatus designed for use in deep level transient spectroscopy (DLTS) experiments and capable of applying more than 5 GPa pressure to a semiconductor crystal sample at temperatures from 300–450 K is described. This compound lever system applies a temperature‐independent stress to the sample throughout the temperature range of interest. As an illustration of this device’s application, the initial result of a uniaxial stress DLTS experiment on EL2 inn‐GaAs is given. EL2 is found to split under the [100] uniaxial stress, denying the AsGaand AsGa–Asimodels.

 

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