Dark current and diffusion length in InGaAs photodiodes grown on GaAs substrates
作者:
E. Ishimura,
T. Kimura,
T. Shiba,
Y. Mihashi,
H. Namizaki,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 7
页码: 644-646
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102724
出版商: AIP
数据来源: AIP
摘要:
In0.53Ga0.47As photodiodes grown on GaAs substrates have been fabricated and analyzed. The dislocation density in the InGaAs layer is 2×107cm−2. A lowest dark current of 3.8×10−4A/cm2at 10 V bias is obtained, which is very stable during a bias‐temperature test ofVb=−10 V,T=175 °C, andt=100 h. The quantum efficiency is more than 85% at &lgr;=1.3 &mgr;m. This device is expected to be practically used. The dark current has been successfully explained by the thermionic emission and thermionic field emission from traps at midgap. The diffusion length of holes in the InGaAs layer is explained by the recombination at dislocations with the finite recombination velocity ofS∼104cm/s.
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