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Flux Reversal in Thin Films of 82% Ni, 18% Fe

 

作者: C. D. Olson,   A. V. Pohm,  

 

期刊: Journal of Applied Physics  (AIP Available online 1958)
卷期: Volume 29, issue 3  

页码: 274-282

 

ISSN:0021-8979

 

年代: 1958

 

DOI:10.1063/1.1723098

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The magnetization reversal process of iron‐nickel films (nominally 82% Ni‐18% Fe) deposited in the presence of a magnetic field to a thickness of about 1000 A to 4000 A have been examined by the application of appropriate fields. Experimental results indicate that at least two different magnetization reversal mechanisms are effective. The first, characterized by relatively long remagnetization periods, involves domain‐wall movement; the second, characterized by relatively short remagnetization periods, is consistent with the rotation of the magnetization in the plane of the film. The threshold for the rotational process is altered by the application of transverse magnetic field in a manner consistent with a simple energy model.

 

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