首页   按字顺浏览 期刊浏览 卷期浏览 Characterization of GaAs/GaAsP quantum wire structures fabricated by atomic layer epita...
Characterization of GaAs/GaAsP quantum wire structures fabricated by atomic layer epitaxy

 

作者: Hideo Isshiki,   Yoshinobu Aoyagi,   Takuo Sugano,   Sohachi Iwai,   Takashi Meguro,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 78, issue 12  

页码: 7277-7281

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.360375

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have developed a fabrication process for isolated quantum wire structures, using advanced atomic layer epitaxy (ALE) techniques based on the self‐limiting effect. We describe several advantages of the self‐limiting effect for the fabrication process of quantum nanostructures. We also present characterizations of the quantum wire structures including photoluminescence (PL) measurements. Due to the fact that the ALE is localized on a nanometer scale and that a growth mode switching technique between isotropic and anisotropic ALE was used, well‐defined GaAs quantum wires with structure control were successfully realized. Also, quantum confinement effects of one‐dimensional systems have been observed clearly in the quantum wires via PL measurements. ©1995 American Institute of Physics.

 

点击下载:  PDF (605KB)



返 回