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Hydrogen effusion from evaporated Si1−xSnx:H (0≤x≤0.2) amorphous semiconductors

 

作者: M. Vergnat,   N. Hadj Zoubir,   S. Houssai¨ni,   G. Marchal,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 13  

页码: 1647-1649

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113880

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The release of hydrogen from Si1−xSnx:H (0≤x≤0.2) amorphous semiconductors prepared by reactive evaporation on substrates maintained at 77 K is monitored by effusion experiments. The effusion peaks are associated with desorption from voids. The deconvolution of these peaks allows one to deduce the different atomic configurations containing hydrogen and to determine their stability and their Gibbs free energy of desorption. ©1995 American Institute of Physics.

 

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