Oxygen‐related vibrational modes produced in Czochralski silicon by hydrogen plasma exposure
作者:
H. J. Stein,
J. W. Medernach,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 79,
issue 5
页码: 2337-2342
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.362658
出版商: AIP
数据来源: AIP
摘要:
Plasma hydrogenation of Czochralski Si has been performed to investigate the introduction of Si–O stretch modes and their correlation with thermal donor formation. Plasma hydrogenation at 275 °C introduces a well‐resolved vibrational absorption band at 1005 cm−1, while absorption due to electronic excitations for thermal donors remains weak. We attribute this band to a Si–O precursor center for thermal donor formation, and suggest it is the oxygen dimer center discussed in other studies of oxygen in Si. Vibrational modes introduced at 990 and 1000 cm−1during post‐hydrogenation furnace annealing at 400 °C correlate with thermal donors TD2 and TD3, respectively. Stretch frequencies for Si–O in thermal donor centers are compared to those for oxygen aggregates in oxygen‐implanted and electron‐irradiated Si.
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