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Fast electron pattern generator–high resolution: A variable shaped beam system for submicron writing

 

作者: E. de Chambost,   A. Frichet,   M. Chartier,   H. Ta The,   J. Trotel,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1986）
卷期: Volume 4, issue 1  

页码: 78-82

 

ISSN:0734-211X

 

年代: 1986

 

DOI:10.1116/1.583398

 

出版商: American Vacuum Society

 

关键词: ELECTRON BEAMS;LINE WIDTHS;RESOLUTION;LITHOGRAPHY;CALIBRATION;BEAM OPTICS;BEAM SHAPING

 

数据来源: AIP

 

摘要:

Fast electron pattern generator–high resolution (FEPG‐HR) is a variable shaped electron beam system, derived from FEPG, specially designed for submicron direct writing, while keeping the multipurpose capabilities. Quarter‐micron linewidth is expected, thanks to a high demagnification of the stencil, reduction of the space charge effect, improvements in accurate metrology, and automatic calibration.

 

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