Spatially and temporally resolved absolute O‐atom concentrations in etching plasmas
作者:
Angeliki D. Tserepi,
Terry A. Miller,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 77,
issue 2
页码: 505-511
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.359032
出版商: AIP
数据来源: AIP
摘要:
The detection of atomic O by two‐photon‐allowed laser‐induced fluorescence is implemented to obtain the spatial distribution and the temporal evolution of oxygen atoms in a 10 MHz parallel‐plate rf discharge. Absolute concentrations are determined via a titration technique for intensities typically found in 20–100 W, 0.1–3 Torr O2discharges, and are in the range 4–30×1014atoms/cm3. The spatial O distribution after initial turn on of the discharge is rather uniform, indicative of a uniform production of O atoms throughout the interelectrode space. Furthermore, the decay of the O concentration reveals information about the reaction of O atoms with surface materials in the plasma environment, while the rise of the population indicates a time‐dependent production rate. The dependence of the O‐concentration rise and decay rates on discharge pressure, power, and gas composition is explored. ©1995 American Institute of Physics.
点击下载:
PDF
(850KB)
返 回