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Spatially and temporally resolved absolute O‐atom concentrations in etching plasmas

 

作者: Angeliki D. Tserepi,   Terry A. Miller,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 2  

页码: 505-511

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359032

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The detection of atomic O by two‐photon‐allowed laser‐induced fluorescence is implemented to obtain the spatial distribution and the temporal evolution of oxygen atoms in a 10 MHz parallel‐plate rf discharge. Absolute concentrations are determined via a titration technique for intensities typically found in 20–100 W, 0.1–3 Torr O2discharges, and are in the range 4–30×1014atoms/cm3. The spatial O distribution after initial turn on of the discharge is rather uniform, indicative of a uniform production of O atoms throughout the interelectrode space. Furthermore, the decay of the O concentration reveals information about the reaction of O atoms with surface materials in the plasma environment, while the rise of the population indicates a time‐dependent production rate. The dependence of the O‐concentration rise and decay rates on discharge pressure, power, and gas composition is explored. ©1995 American Institute of Physics.

 

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