Fluorine field ion source using fluorine–helium gas mixture
作者:
Yukinori Ochiai,
Eiichi Nomura,
Yoshikatsu Kojima,
Shinji Matsui,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1991)
卷期:
Volume 9,
issue 1
页码: 51-56
ISSN:0734-2101
年代: 1991
DOI:10.1116/1.577129
出版商: American Vacuum Society
关键词: FLUORINE IONS;FIELD IONIZATION;ION SOURCES;HELIUM;GASES;MIXTURES;TUNGSTEN;FIELD EMISSION;ULTRALOW TEMPERATURE;VERY LOW TEMPERATURE;LOW TEMPERATURE;IV CHARACTERISTIC;TUNNEL EFFECT
数据来源: AIP
摘要:
The ionization of fluorine with a field ion source is demonstrated. A fluorine(10%)–helium(90%) gas mixture and a (110) oriented tungsten emitter are used. The ion source is operated at a pressure of 1.5×10−5Torr and at temperatures between 7 and 80 K using a (110) plane of the emitter. Two current peaks in theI–Vcharacteristics are observed at temperatures over 46 K and one of them is confirmed to correspond to fluorine ion emission, which shows a maximum at 52 K and has an angular current density of 1.5×10−6A/sr and a brightness of 6×108A/cm2 sr. TheI–Vcharacteristics’ dependency on the crystal planes of the emitter tip such as (111) and (121) are also presented.
点击下载:
PDF
(460KB)
返 回