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Fluorine field ion source using fluorine–helium gas mixture

 

作者: Yukinori Ochiai,   Eiichi Nomura,   Yoshikatsu Kojima,   Shinji Matsui,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1991)
卷期: Volume 9, issue 1  

页码: 51-56

 

ISSN:0734-2101

 

年代: 1991

 

DOI:10.1116/1.577129

 

出版商: American Vacuum Society

 

关键词: FLUORINE IONS;FIELD IONIZATION;ION SOURCES;HELIUM;GASES;MIXTURES;TUNGSTEN;FIELD EMISSION;ULTRALOW TEMPERATURE;VERY LOW TEMPERATURE;LOW TEMPERATURE;IV CHARACTERISTIC;TUNNEL EFFECT

 

数据来源: AIP

 

摘要:

The ionization of fluorine with a field ion source is demonstrated. A fluorine(10%)–helium(90%) gas mixture and a (110) oriented tungsten emitter are used. The ion source is operated at a pressure of 1.5×10−5Torr and at temperatures between 7 and 80 K using a (110) plane of the emitter. Two current peaks in theI–Vcharacteristics are observed at temperatures over 46 K and one of them is confirmed to correspond to fluorine ion emission, which shows a maximum at 52 K and has an angular current density of 1.5×10−6A/sr and a brightness of 6×108A/cm2 sr. TheI–Vcharacteristics’ dependency on the crystal planes of the emitter tip such as (111) and (121) are also presented.

 

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