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Some electrical measurements on gaseous ion implanted metallic and insulating thin films

 

作者: S.B. Ogale,   S.V. Ghaisas,   A.S. Ogale,   M.R. Bhiday,   A.S. Nigavekar,   V.N. Bhoraskar,  

 

期刊: Radiation Effects  （Taylor Available online 1982）
卷期: Volume 63, issue 1-4  

页码: 73-80

 

ISSN:0033-7579

 

年代: 1982

 

DOI:10.1080/00337578208222828

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Experimental results on changes in conductivity of N2+ and Ar+bombarded thin copper, aluminium and bismuth films are given along with the preliminary observations on photoconductivity of N2+ bombarded Bi2O3thin films. The performance of a low cost, medium resolution 200 keV ion implantation system, used in the above experiments is also discussed.

 

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