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Stress distribution in an aluminum interconnect of very large scale integration

 

作者: H. Niwa,   H. Yagi,   H. Tsuchikawa,   Masaharu Kato,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 1  

页码: 328-333

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.347137

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Thermal stress‐induced void formation in aluminum interconnect has become a major reliability problem in the usage of very large scale integration circuits. The purpose of this work is to analytically evaluate stresses in the Al line. By applying Eshelby’s method in micromechanics, the stresses in the Al line were estimated analytically as a function of the aspect ratio of the Al line cross section. The yielding criteria in plasticity were applied to examine whether the calculated stresses can induce relaxation by plastic deformation. The analytically calculated results were compared with previous results of numerical calculation and experimental observation.

 

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