Arsenic Isoconcentration Diffusion Studies in Silicon
作者:
B. J. Masters,
J. M. Fairfield,
期刊:
Journal of Applied Physics
(AIP Available online 1969)
卷期:
Volume 40,
issue 6
页码: 2390-2394
ISSN:0021-8979
年代: 1969
DOI:10.1063/1.1658001
出版商: AIP
数据来源: AIP
摘要:
Arsenic radiotracer diffusions have been performed both in intrinsic and in homogeneously doped extrinsic silicon single crystals. Under intrinsic conditions, the tracer diffusion coefficient may be represented by the expressionDi=60 exp (−4.20 eV/kT) cm2/sec. Measured in extrinsic silicon, in the absence of a concentration gradient, the tracer diffusion coefficient conforms with the relationshipD=Di(n/ni), in which (n/ni) in the ratio of the free electron concentration in the extrinsic sample to that of intrinsic silicon at the diffusion temperature.
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