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Arsenic Isoconcentration Diffusion Studies in Silicon

 

作者: B. J. Masters,   J. M. Fairfield,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 6  

页码: 2390-2394

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1658001

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Arsenic radiotracer diffusions have been performed both in intrinsic and in homogeneously doped extrinsic silicon single crystals. Under intrinsic conditions, the tracer diffusion coefficient may be represented by the expressionDi=60 exp (−4.20 eV/kT) cm2/sec. Measured in extrinsic silicon, in the absence of a concentration gradient, the tracer diffusion coefficient conforms with the relationshipD=Di(n/ni), in which (n/ni) in the ratio of the free electron concentration in the extrinsic sample to that of intrinsic silicon at the diffusion temperature.

 

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