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CO2laser‐assisted removal of submicron particles from solid surfaces

 

作者: J. B. He´roux,   S. Boughaba,   I. Ressejac,   E. Sacher,   M. Meunier,  

 

期刊: Journal of Applied Physics  (AIP Available online 1996)
卷期: Volume 79, issue 6  

页码: 2857-2862

 

ISSN:0021-8979

 

年代: 1996

 

DOI:10.1063/1.361280

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A CO2laser‐based system was used to provoke the vapor‐assisted removal of contaminating particles from different kinds of surfaces. Particles of alumina, silicon carbide, boron carbide, and cerium dioxide, with a size as small as 0.1 &mgr;m, have been efficiently removed from silicon, gold, and silicon dioxide surfaces. The dependence of the cleaning efficiency on the laser fluence was investigated; a threshold was found at 0.65 J/cm2and the efficiency was highest for a fluence ranging from 2.9 to 3.2 J/cm2for silicon, and 3.2 J/cm2for gold and silicon dioxide surfaces. The amount of the water vapor which condenses at the surface was also found to play a major role, the best results being obtained with a condensed thickness calculated to be 6 &mgr;m. The zeta potential value of the contaminant particles with respect to that of the surface greatly influences the cleaning process. ©1996 American Institute of Physics.

 

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