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Space‐charge effect on hole transport in resistive hydrogenated amorphous silicon

 

作者: Toshio Nishida,   Yasushi Hoshino,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 59, issue 7  

页码: 2467-2470

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337015

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Hole transport properties of resistive hydrogenated amorphous silicon (1012&OHgr; cm) are studied by a pulsed photoconductivity technique. Transit time is analyzed by the Scher–Montroll plotting method. Estimation of mobility is done with photocurrent measurement under a space‐charge‐limited condition, and it is confirmed that the mobility value measured under this condition agrees with the calculated value found from space‐charge‐limited current. With no space‐charge effect, temperature dependence and electric field dependence of transit time is represented by &tgr;=&tgr;0 E−1/&agr;’ exp(&Dgr;/kT).

 

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