Space‐charge effect on hole transport in resistive hydrogenated amorphous silicon
作者:
Toshio Nishida,
Yasushi Hoshino,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 59,
issue 7
页码: 2467-2470
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.337015
出版商: AIP
数据来源: AIP
摘要:
Hole transport properties of resistive hydrogenated amorphous silicon (1012&OHgr; cm) are studied by a pulsed photoconductivity technique. Transit time is analyzed by the Scher–Montroll plotting method. Estimation of mobility is done with photocurrent measurement under a space‐charge‐limited condition, and it is confirmed that the mobility value measured under this condition agrees with the calculated value found from space‐charge‐limited current. With no space‐charge effect, temperature dependence and electric field dependence of transit time is represented by &tgr;=&tgr;0 E−1/&agr;’ exp(&Dgr;/kT).
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