SiGe quantum dots prepared on an ordered mesoporous silica coated Si substrate
作者:
Y. S. Tang,
S. Cai,
G. Jin,
J. Duan,
K. L. Wang,
H. M. Soyez,
B. S. Dunn,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 17
页码: 2448-2450
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120085
出版商: AIP
数据来源: AIP
摘要:
This letter reports a new way of preparing wafer sized SiGe quantum dots on an ordered mesoporous sol gel silica coated Si. It was found from x-ray diffraction that very good regular layers of mesoscopic sized SiGe quantum dots can be formed in the silica. Initial low temperature photoluminescence measurements show much improved light emission of the buried dots. This technique is a potential low cost method for producing quantum dot arrays. ©1997 American Institute of Physics.
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