Depth distribution of gallium ions implanted into silicon crystals
作者:
G. Dearnaley,
G. A. Gard,
W. Temple,
M. A. Wilkins,
期刊:
Applied Physics Letters
(AIP Available online 1975)
卷期:
Volume 27,
issue 1
页码: 17-18
ISSN:0003-6951
年代: 1975
DOI:10.1063/1.88270
出版商: AIP
数据来源: AIP
摘要:
Radioactive72Ga+ions have been implanted at room temperature into misoriented silicon crystals to a low fluence of 1013ions/cm2. The resulting depth distribution, measured by anodic stripping, shows a prominent penetrating tail. Previously, such tails have been observed only in high‐temperature bombardments and have therefore been attributed to an enhanced diffusion mechanism. It is shown that the scattering of ions into inclined planar or axial channels can account for all the Ga distributions observed. Some consequences for Si device fabrication are discussed.
点击下载:
PDF
(156KB)
返 回