Potential Distributions and Topography ofnpn‐Type Junctions in Photosensitive Epitaxial PbS Films
作者:
F. L. English,
M. K. Parsons,
R. B. Schoolar,
H. R. Riedl,
期刊:
Journal of Applied Physics
(AIP Available online 1969)
卷期:
Volume 40,
issue 8
页码: 3293-3296
ISSN:0021-8979
年代: 1969
DOI:10.1063/1.1658177
出版商: AIP
数据来源: AIP
摘要:
The electron‐mirror microscope (EMM) has been used to study photosensitivenpn‐type junctions in heat‐treated epitaxial PbS films. The EMM indicated variations in junction symmetry and strength on a much smaller scale than previously observed with a light‐spot scanning technique. In addition, the variations observed were found to correlate with surface topography. Regions of high junction density that have nearly zero photovoltaic response due to cancellation effects, were clearly resolved with the EMM.
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