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Potential Distributions and Topography ofnpn‐Type Junctions in Photosensitive Epitaxial PbS Films

 

作者: F. L. English,   M. K. Parsons,   R. B. Schoolar,   H. R. Riedl,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 8  

页码: 3293-3296

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1658177

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electron‐mirror microscope (EMM) has been used to study photosensitivenpn‐type junctions in heat‐treated epitaxial PbS films. The EMM indicated variations in junction symmetry and strength on a much smaller scale than previously observed with a light‐spot scanning technique. In addition, the variations observed were found to correlate with surface topography. Regions of high junction density that have nearly zero photovoltaic response due to cancellation effects, were clearly resolved with the EMM.

 

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