Electrical characterization of two deep electron traps introduced in epitaxially grownn-GaNduring He-ion irradiation
作者:
F. D. Auret,
S. A. Goodman,
F. K. Koschnick,
J-M. Spaeth,
B. Beaumont,
P. Gibart,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 25
页码: 3745-3747
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.122881
出版商: AIP
数据来源: AIP
摘要:
Epitaxialn-GaNwas irradiated with 5.4-MeV He ions. Capacitance–voltage(C–V)measurements showed that 5.4-MeV He ions remove free carriers at a rate of6200±300 cm−1in the first micron below the surface. Deep level transient spectroscopy (DLTS) revealed that, in addition to the radiation-induced defects previously detected by DLTS at 0.18–0.20 eV below the conduction band, He-ion irradiation introduced two additional prominent defects, ER4(EC-0.78 eV)and ER5(EC-0.95 eV)at rates of1510±300and3030±500 cm−1,respectively. Capture cross-section measurements revealed that electron capture kinetics of ER5 is similar to that of a line defect. ©1998 American Institute of Physics.
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