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Electrical characterization of two deep electron traps introduced in epitaxially grownn-GaNduring He-ion irradiation

 

作者: F. D. Auret,   S. A. Goodman,   F. K. Koschnick,   J-M. Spaeth,   B. Beaumont,   P. Gibart,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 73, issue 25  

页码: 3745-3747

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.122881

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Epitaxialn-GaNwas irradiated with 5.4-MeV He ions. Capacitance–voltage(C–V)measurements showed that 5.4-MeV He ions remove free carriers at a rate of6200±300 cm−1in the first micron below the surface. Deep level transient spectroscopy (DLTS) revealed that, in addition to the radiation-induced defects previously detected by DLTS at 0.18–0.20 eV below the conduction band, He-ion irradiation introduced two additional prominent defects, ER4(EC-0.78 eV)and ER5(EC-0.95 eV)at rates of1510±300and3030±500 cm−1,respectively. Capture cross-section measurements revealed that electron capture kinetics of ER5 is similar to that of a line defect. ©1998 American Institute of Physics.

 

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