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Reply to ‘‘Comments on ‘Measurements of minority‐carrier diffusion length inn‐CuInSe2by electron‐beam‐induced current method’ ’’ [J. Appl. Phys.66, 5412 (1989)]

 

作者: R. Scheer,   H. J. Lewerenz,  

 

期刊: Journal of Applied Physics  （AIP Available online 1990）
卷期: Volume 68, issue 7  

页码: 3760-3760

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.346296

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The application of the vertical electron‐beam‐induced current configuration for diffusion lengths in the submicron meter range is briefly discussed. Results of our experiments [J. Appl. Phys.66, 5412 (1989)] are compared to earlier investigations by other authors.

 

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