A distinct recombination regime in amorphous silicon diodes under double injection
作者:
Daxing Han,
Keda Wang,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 7
页码: 879-881
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113418
出版商: AIP
数据来源: AIP
摘要:
Room temperature electroluminescence efficiency as a function of forward bias voltage,VF, shows that there are two recombination regions in device qualitya‐Si:H diodes. The recombination threshold voltage,Vt1, is 0.48–0.49 V. The transition voltage,Vt2, is 0.7–0.8 V. WhenVt1<VF<Vt2the electric field strongly enhances the luminescence efficiency, whenVF≳Vt2the luminescence efficiency is almost independent of the electric field. The increase of the EL efficiency in the low injection regime depends on the competition of radiative and nonradiative recombination. ©1995 American Institute of Physics.
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