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A distinct recombination regime in amorphous silicon diodes under double injection

 

作者: Daxing Han,   Keda Wang,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 7  

页码: 879-881

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113418

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Room temperature electroluminescence efficiency as a function of forward bias voltage,VF, shows that there are two recombination regions in device qualitya‐Si:H diodes. The recombination threshold voltage,Vt1, is 0.48–0.49 V. The transition voltage,Vt2, is 0.7–0.8 V. WhenVt1<VF<Vt2the electric field strongly enhances the luminescence efficiency, whenVF≳Vt2the luminescence efficiency is almost independent of the electric field. The increase of the EL efficiency in the low injection regime depends on the competition of radiative and nonradiative recombination. ©1995 American Institute of Physics.

 

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