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Spatial resolution of capacitance-voltage profiles in quantum well structures

 

作者: C. R. Moon,   Byung-Doo Choe,   S. D. Kwon,   H. Lim,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 72, issue 10  

页码: 1196-1198

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.121011

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The temperature dependence of the spatial resolution of capacitance-voltage(C−V)profiles in the compositional quantum well (CQW) is investigated. The apparent carrier distribution (ACD) peak in theIn0.2Ga0.8As/GaAssingle QW is observed to show a strong temperature dependence, compared to that in Si &dgr;-doped GaAs. The ACD peak in CQW is wider (narrower) than the spatial extent of ground-state wave function at high (low) temperatures. The self-consistent numerical simulations on the carrier distribution show that the full width at half maximum of ACD peak in CQW is mainly affected by the debye averaging process at high temperatures and the change in the position expectation value of the two-dimensional electrons at low temperatures. This change in the position expectation value is found to be much smaller than the spatial extent of ground-state electron wave function. ©1998 American Institute of Physics.

 

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