Trends in temperature‐dependent Schottky barrier formation: The Ga/GaAs and Mn/GaAs interfaces
作者:
K. Stiles,
S. F. Horng,
A. Kahn,
J. McKinley,
D. G. Kilday,
G. Margaritondo,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1988)
卷期:
Volume 6,
issue 4
页码: 1392-1396
ISSN:0734-211X
年代: 1988
DOI:10.1116/1.584228
出版商: American Vacuum Society
关键词: MANGANESE;GALLIUM;GALLIUM ARSENIDES;INTERFACE STRUCTURE;PHOTOEMISSION;SURFACE STRUCTURE;SURFACE COATING;COATINGS;FERMI LEVEL;INTERFACE STATES;IMPURITY STATES;SCHOTTKY BARRIER DIODES;METAL−SEMICONDUCTOR CONTACTS;GaAs;Ga;Mn;SCHOTTKY BARRIERS
数据来源: AIP
摘要:
We use soft x‐ray photoemission spectroscopy to study the Ga/GaAs and Mn/GaAs interfaces formed at room temperature (RT) and at low temperature (LT=80−100 K). The LT Ga/GaAs interface exhibits the strongly inhibited clustering observed at other nonreactive metal/GaAs interfaces. The Mn–GaAs reaction is slowed somewhat. At both interfaces, the effect of temperature onEFmovement is in accord with the trends previously set: initial band bending onn‐GaAs is slowed at LT, whereas band bending onp‐GaAs is not affected significantly. For both Ga and Mn/GaAs,EFmovement at low coverages is consistent with the explanation proposed for thespand noble metals: introduction of donor states from, e.g., the specific adsorbate levels. Studies of the noble metal interfaces with GaAs have showed that the establishment of the finalEFposition is related to the appearance of metallicity at the interface; Mn/GaAs provides direct evidence for that interpretation.
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