Sputtered atom ejection from Ge and the annealing of ion bombardment induced disorder
作者:
E.D. Zwangobani,
R.J. Macdonald,
期刊:
Radiation Effects
(Taylor Available online 1971)
卷期:
Volume 11,
issue 3-4
页码: 215-220
ISSN:0033-7579
年代: 1971
DOI:10.1080/00337577108231107
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
It has been previously established that it is necessary to keep single targets of Ge and Si above a certain critical temperatureTabefore one can obtain an ejection pattern indicative of surface order. In the following work, we report on the dependence of the disorder to order transition temperature,Taon the incident ion mass, the dose rate and the crystallography of the target. The disorder to order transition temperature,Tahas been measured for 5, 10 and 15 keV Ar+, K+and Ne+bombardment of (111), (110) and (100) Ge, using the sputtered atom ejection pattern to indicate the restitution of order. The dose rate dependence of the transition temperature,Ta, was used to calculate activation energies for the transition occurring.
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